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High-speed semiconductor mask laser drawing device 'ULTRA'
"ULTRA" is a high-speed, high-resolution laser drawing device suitable for semiconductor mask creation. The "ULTRA" is a cost-effective mask drawing device equipped with high productivity, high precision, high uniformity, and ultra-high precision alignment accuracy.
Industry high-level high-resolution or high-throughput maskless laser direct writing equipment
Raith is known as a company that provides advanced technology in the field of nanofabrication, developing and designing cutting-edge tools including FIB-SEM and maskless EB direct writing systems. The company has a product lineup particularly suitable for fine pattern formation and nanoscale structure creation, which is utilized by a wide range of research institutions and industries. In 2021, it further expanded its product portfolio by acquiring 4PICO litho, a company that developed and manufactured maskless laser direct writing systems. Raith's tools support not only patterning on various substrates but also 3D structuring, boasting over 1,200 units delivered worldwide.
High-speed high-resolution laser exposure device
The "DWL 2000 GS" is a flexible, high-speed, high-resolution laser drawing device suitable for grayscale lithography. Grayscale lithography is a technique that reproduces slope patterns, such as microlenses and blazed diffraction gratings, on a resist, differing from traditional binary lithography. The "DWL 2000 GS" series has a maximum drawing area of 200x200 mm² or 400x400 mm², enabling high-speed, high-precision patterning on masks and wafers for applications requiring MEMS, BioMEMS, Micro-Optics, ASIC, Micro Fluidics, sensors, holograms, and other fine structures. To enhance surface roughness accuracy in grayscale lithography applications, it supports 1000 levels of grayscale. 【Features】 ■ High stability and high-speed, high-resolution exposure ■ Up to five selectable drawing modes ■ High-precision alignment camera system ■ Grayscale drawing mode *For more details, please refer to the catalog or feel free to contact us.
High-speed pattern generator
The "VPG+ Series" is a high-speed exposure system that can accommodate large mask manufacturing, resist master creation, and direct drawing on various flat substrates due to its fast exposure speed. It can be utilized in fields that require semiconductors, displays, sensors, MEMS, advanced packaging, LED production, life sciences, and microfabrication. 【Features】 ■ High resolution ■ High image quality ■ High throughput ■ Ideal for high-speed photomask production ■ Capable of direct drawing on any flat substrate *For more details, please refer to the catalog or feel free to contact us.
A high-speed drawing device compatible with 300x300mm square substrates has been added to the VPG series.
- High precision and high-speed rendering - Maximum drawing area 300x300mm²
